Date: Friday, 21-Nov-97 04:55:24 GMT Server: NCSA/SMI-1.0 MIME-version: 1.0 Content-type: text/html
- 1997 Photomask Japan
- Multipass gray printing for new MEBES® 4500S mask lithography system by F. Abboud, R. Dean, J. Doering, W. Eckes, M. Gesley, U. Hofmann, T. Mulera, R. Naber, M. Pastor, W. Phillips, J. Raphael, F. Raymond III, and C. Sauer.
- Post apply bake optimization for 6025 masks by Peter Buck and Robert Holmström.
- 1996 SPIE Annual Symposium on Photomask Technology and Management
- Plasma etching of Cr films in the fabrication of photomasks Part 2--a comparison of etch technologies and a first look at defects by Tom Coleman and Peter Buck of Etec Systems, Inc. and David Johnson of Plasma-Therm.
- Comparison of Reticle Placement Performance Using Two-Point and Multipoint Fitting Algorithms by H. Christopher Hamaker, Jerry Martyniuk, Robert M. Sills, Jeffrey K. Varner, and Keith P. Standiford.
- Improvement of CD uniformity with PBS by optimizing the crossover development step by Robert Dean and Charles Sauer.
- 1996 BACUS Symposium
- 1995 BACUS Symposium
- Further Work in Optimizing PBS: Is It Capable of Meeting Specifications for 256 Mbit DRAM Reticle Manufacturing by Robert Dean and Charles Sauer, presented also at 1995 SPIE Microlithography VIII conference and 1995 BACUS Symposium.
- Plasma etching of chromium films in the fabrication of photomasks by Tom Coleman and Peter Buck.
- Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference by Tom Coleman, Len Gasiorek, Mike Lubin, Bob Naber, William Wang, Keith Wires of Etec Systems, Inc. and Jim DeWitt and Joe Watson of Intel Corporation.
- Investigation of MEBES 4500 system composite performance by Dave Alexander, Allen Cook, Len Gasiorek, Mark Mayse, Bob Naber, Wayne Phillips, Chuck Sauer of Etec Systems, Inc. and Jim DeWitt and Joe Watson of Intel Corporation.
- Optimizing the Use of Multipass Printing to Minimize Printing Errors in Advanced Laser Reticle Writing Systems by H. C. Hamaker, G. A. Burns, and P. D. Buck.
- 1995 International Symposium on 193 nm Lithography
- Pattern Generator Requirements for 180 nm Lithography by P. Allen, M. Gesley, R. L. Smith, K. Standiford.
- 1995 SPIE Microlithography VIII conference
- Relative Merits of Using Maximum Error vs 3sigma in Describing the Performance of Laser-Exposure Reticle Writing Systems by Chris Hamaker.
- Further Work in Optimizing PBS: Is It Capable of Meeting Specifications for 256 Mbit DRAM Reticle Manufacturing by Robert Dean and Charles Sauer, presented also 1995 BACUS Symposium.
- IEPB 1995
- Experimental Evaluation of an E-Beam Pulse Modulated Blanker (160 MHz) for Next-Generation E-Beam Raster Scan Systems by Andrew Muray, Dave Colby, Robin Teitzel, and Mark Gesley.
- 1994 BACUS Symposium
- Technical Performance of the ALTA 3000 Laser Writer by Brian Grenon of IBM, Peter Buck, et al.
- Investigation of a Negative i-line Resist with the CORE 2564 Laser Writer by Brian Grenon of IBM, Peter Buck, et al.
- PBS Resist Profile Studies for Submicron Mask Lithography by Robert Dean, Homer Lem, and Charles Sauer with Hong Chang from Intel.
- Application of Charge Dissipation Material in MEBESÆ Phase Shift Mask Fabrication by Zoilo C. H. Tan and Charles Sauer.
- Life after the 256 Mbit DRAM: E-Beam Maskmakers at the Year 2000 by Keith Standiford with John C. Weisner from Nikon Precision Inc.
- 1994 SPIE Microlithography VIII conference
- Techniques for improving overlay on multilayer phase shift masks by Chris Hamaker, et al.
- IEPB 1994
- Manufacturing Issues for OPC Masks by Andrew Muray with Chris Spence from Advanced Micro Devices.
- Yaw Compensation for an E-Beam Lithography System by Robert Innes.
- Dynamic Corrections in MEBESÆ 4500 by Henry Pearce-Percy, Richard Prior, Frank Abboud, Albert Benveniste, Leonard Gasiorek, Michael Lubin, and Frederick Raymond.
- Published in Solid State Technology 1994
- Submicron E-Beam Mask Lithography with PBS Resist by Robert Dean, Homer Lem, and Charles Sauer.
- 1993 BACUS Symposium
- A Comparison of Wet and Dry Chrome Etching with the CORE 2564 by Peter Buck with Brian Grenon from IBM.